Open AccessSurface Topography Measurement
Author(s) -
Tan Özgür,
Reiff EllenChristine
Publication year - 2021
Publication title -
photonicsviews
Language(s) - English
Resource type - Journals
eISSN - 2626-1308
pISSN - 2626-1294
DOI - 10.1002/phvs.202170210
Subject(s) - wafer , surface (topology) , astronomical interferometer , nanometre , characterization (materials science) , tribology , optics , materials science , white light interferometry , interferometry , development (topology) , white light , nanotechnology , physics , geometry , composite material , mathematical analysis , mathematics
When testing the surface quality of the finest structures, white‐light interferometers are in their element, both in production and development, as well as in laboratories and research. This measurement principle works on almost all materials, operates without contact, providing surface profiles in 3D with height resolutions in the nanometer range. Today, large‐area measurements are just as possible as detailed investigations with high lateral resolution, e.g. for surface characterization of wafers, optical components or in tribology.