Open AccessEUV Microscopy: A Unique Approach for Materials Characterization
Author(s) -
Manser Rosy
Publication year - 2019
Publication title -
photonicsviews
Language(s) - English
Resource type - Journals
eISSN - 2626-1308
pISSN - 2626-1294
DOI - 10.1002/phvs.201900027
Subject(s) - extreme ultraviolet lithography , characterization (materials science) , nanotechnology , extreme ultraviolet , materials science , ultrashort pulse , instrumentation (computer programming) , nanostructure , nano , computer science , optics , physics , laser , operating system , composite material
Understanding of fundamental processes as well as nanostructure performance of nano‐engineered systems, novel materials, and quantum architectures, often requires advanced imaging and spectroscopic tools. This is particularly critical as dimensions shrink below 100 nm as visible light cannot directly probe function at these lengthscales. Ultrafast extreme ultraviolet (EUV) techniques offer a pathway to both functional characterization and imaging at sub‐50 nm lengthscales, and a host of use cases in materials and nano science have been demonstrated. Progress in terms of source and instrumentation development are assisting the rapid increase in the availability of these approaches in the laboratory.