Open AccessSpectroscopy Applications for Plasma Monitoring
Author(s) -
Kane Janel
Publication year - 2019
Publication title -
photonicsviews
Language(s) - English
Resource type - Journals
eISSN - 2626-1308
pISSN - 2626-1294
DOI - 10.1002/phvs.201900026
Subject(s) - plasma , plasma etching , spectroscopy , etching (microfabrication) , materials science , aerospace , plasma chemistry , deposition (geology) , nanotechnology , optoelectronics , aerospace engineering , physics , engineering , geology , nuclear physics , astronomy , paleontology , layer (electronics) , sediment
Plasmas are used for a large number of applications in spectroscopy. Most commonly might be thin film deposition and photo‐resist etching for semiconductors and solar collectors, but plasmas also have applications in biomedical and aerospace, along with other industries. Plasma diagnostics demand high‐resolution spectra and high‐speed data capture that Avantes is known for. Avantes’ instruments can be found in plasma research and industrial environments all over the globe.