Premium
A process model for nonisothermal photopolymerization with a laser light source. I: Basic model development
Author(s) -
Flach Lawrance,
Chartoff Richard P.
Publication year - 1995
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760350605
Subject(s) - photopolymer , stereolithography , materials science , photoinitiator , laser , rapid prototyping , polymer , penetration depth , process (computing) , penetration (warfare) , irradiation , optics , monomer , composite material , computer science , physics , operations research , nuclear physics , operating system , engineering
A mathematical model for a laser‐induced photopolymerization process has been developed. This model simulates important aspects of stereolithography, a rapid prototyping process used for the production of three‐dimensional plastic parts. The model consists of a set of coupled partial differential equations and considers irradiation, chemical reaction, and heat transfer in a small zone of material exposed to a stationary UV laser source. Numerical techniques are used for an approximate solution of the model equations, and the output includes spatial and temporal variations in the conversion of monomer to polymer, depletion of photoinitiator, and local variations of temperature in and around the region contacted by the laser light. Maximum conversions of approximately 60% and peak temperature rises of approximately 35° C were calculated for the cylindrical exposed region. Results have provided insights concerning laser dwell time, depth penetration, and the uniformity of polymer formed during the stereolithography process.