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Spin coating of very thin polymer films
Author(s) -
Extrand Charles W.
Publication year - 1994
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760340503
Subject(s) - materials science , wafer , polystyrene , cyclohexane , polymer , spin coating , solvent , ellipsometry , thin film , composite material , toluene , natural rubber , coating , analytical chemistry (journal) , polymer chemistry , nanotechnology , chromatography , organic chemistry , chemistry
Very thin films of natural rubber, polystyrene, and poly(methylmethacrylate) have been spun‐cast on silicon wafers from dilute solutions of toluene and cyclohexane. Layers were uniform across the wafers, ranging from 0.5 to 170 nm, as measured by ellipsometry. Their average thickness e increased with solution concentration and decreased with rotational rate w . Changing the volume of the solution pipetted onto the wafers did not affect the final thickness, whereas changing the solvent did. The previously reported empirical relation for much thicker films, e α ω −1/2 , held over the range investigated here.