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Anti‐reflective coating for deep UV lithography process enhancement
Author(s) -
Barnes Gregg A.,
Flaim Tony D.,
Jones Susan K.,
Dudley Bruce W.,
Koester David A.,
Peters Charles R.,
Bobbio Stephen M.
Publication year - 1992
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760322106
Subject(s) - materials science , laser linewidth , resist , coating , layer (electronics) , lithography , photoresist , substrate (aquarium) , photolithography , optoelectronics , extreme ultraviolet lithography , arc (geometry) , process (computing) , optics , nanotechnology , computer science , laser , oceanography , physics , geometry , mathematics , geology , operating system
We describe here performance enhancements provided by an anti‐reflective coating (ARC), developed for deep UV applications. The reduction in substrate reflections provided by the ARC layer results in significant increases in resolution capability and process latitude compared to single layer deep UV resist. Increased linewidth control and patterning capability for highly reflective, grainy, and topographical substrates is demonstrated.