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Aqueous base developable deep‐UV resist based on chemically amplified crosslinking of phenolic resin
Author(s) -
Schaedeli U.,
Holzwarth H.,
Muenzel N.,
Schulz R.
Publication year - 1992
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760322014
Subject(s) - resist , acetal , photoresist , cleave , moiety , polymer , aqueous solution , depolymerization , onium , materials science , electrophile , polymer chemistry , organic chemistry , chemistry , catalysis , nanotechnology , ion , layer (electronics) , enzyme
Abstract The principle of chemical amplification has proven to be successful for the design of highly sensitive, high resolution resist material. In many cases a strong Broensted acid, generated by photolysis of onium salt precursors, has been used to catalytically cleave an acid labile blocking moiety. A new approach to negative tone resist is based on acid catalyzed cleavage of acetal blocked aromatic aldehydes, which act as “latent electrophiles” and, under the influence of strong acid, react with the surrounding phenolic resin. If the acetal is polyfunctional or incorporated in a phenolic polymer chain, an increase in molecular weight, due to crosslinking, is observed. The resist is highly sensitive and allows the resolution of 0.5 μm features without swelling.