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Improving adhesion between thin chromium film and polyimide substrate by Ar + irradiation
Author(s) -
Koh S. K.,
Pae K. D.,
Caracciolo R.
Publication year - 1992
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760320807
Subject(s) - x ray photoelectron spectroscopy , materials science , fourier transform infrared spectroscopy , analytical chemistry (journal) , irradiation , scanning electron microscope , polyimide , thin film , substrate (aquarium) , annealing (glass) , rutherford backscattering spectrometry , chromium , adhesion , ion , nuclear chemistry , layer (electronics) , composite material , chemical engineering , nanotechnology , chemistry , metallurgy , organic chemistry , physics , oceanography , geology , nuclear physics , engineering
Abstract Ar + irradiation and annealing at an elevated temperature are used to improve the adhesion of deposited Cr thin films by vacuum evaporation onto polyimide (PI) substrates. The Ar + ions of 50 and 200 keV and various Ar + doses ranging from 1 × 10 13 to 2 × 10 16 ions/cm 2 are chosen for the experiments, after many preliminary trials. The surface analyses are conducted employing Rutherford Backscattering Spectroscopy (RBS), Fourier transform infrared spectrometry (FTIR), X‐ray photoelectron spectroscopy (XPS), and Scanning electron microscopy (SEM). Ar + irradiation produces an interfacial layer of about 100 Å (10 nm) thick in which Cr particles and PI molecules are physically mixed and chemically bonded. The chemical bonds of CrO and a trace of CrC are observed by XPS and FTIR. Impact‐wear tests are also conducted in order to determine the effects of the Ar + irradiation on the wear property of a Cr/PI system. A significant increase in the property is observed and the increase appears to be a function of the degree of adhesion of the Cr film to the PI substrate.