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Image reversal in a negative deep UV resist
Author(s) -
Hargreaves John S.
Publication year - 1990
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760302104
Subject(s) - resist , materials science , photoresist , nanotechnology , layer (electronics)
A negative deep UV resist, XP 8843 (Shipley Co.), Since this paper was written the name of this resist has been changed from XP 8843 to SNR 248‐10. has been made positive by the addition of 1,2,4‐triazole. This is achieved by exposing the resist in the presence of the additive thereby inhibiting the crosslinking reaction. After exposure the additive is removed by heating under a vacuum. Unexposed areas of the resist may then be exposed and the resist crosslinked under normal processing conditions.