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Photochemical free‐volume generation in poly(methyl methacrylate) photoresists
Author(s) -
Limm William,
Winnik Mitchell A.,
Smith Barton A.
Publication year - 1989
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760291406
Subject(s) - materials science , dissolution , dopant , methyl methacrylate , poly(methyl methacrylate) , solvent , acetone , quenching (fluorescence) , irradiation , photochemistry , methacrylate , fluorescence , polymer , chemical engineering , doping , composite material , optics , organic chemistry , polymerization , optoelectronics , chemistry , physics , nuclear physics , engineering
The dissolution rates of poly(methyl methacrylate) [PMMA] thin films on quartz substrates are studied by a combination of laser interferometry and fluorescence quenching methods. In this way one can monitor the penetration, rate of the solvent (2‐butanone, 2‐pentanone) into the film. When these films were prepared containing 2 to 8 percent Meldrum's diazo (1) as a dopant, the dopant acted as a mild retarder of film dissolution. Upon irradiation at 254 nm, 1 is converted to CO, N 2 + acetone, and this process leads to a pronounced acceleration' of the PMMA film dissolution rate.