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A new contrast enhanced lithography (cel) process using “chinese rosin” as a binder
Author(s) -
Tomo Yoichi,
Jinbo Hideyuki,
Yamashita Yoshio,
Ohno Seigo,
Asano Takateru,
Nishibu Satoshi,
Umehara Hiroshi
Publication year - 1989
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760291404
Subject(s) - materials science , lithography , resist , rosin , layer (electronics) , salt (chemistry) , solvent , chemical engineering , photoresist , aqueous solution , nanotechnology , optics , optoelectronics , organic chemistry , chemistry , physics , resin acid , engineering
A new contrast enhanced lithography (CEL) process using Chinese rosin as a binder is described. This binder is soluble in both non‐polar organic solvent and aqueous alkaline solution. Good coatability with organic solvent, no formation of mixing layer, and direct development without removing the CEL layer are the major advantages of this process. Among the three different kinds of photobleachable dyes, DZ‐2 (diazonium salt) has the best optical property and the resist profile is improved on g‐line reduction projection printing at the smallest dose. Moreover, this DZ‐2—Chinese rosin system is also effective at 365 nm, and the resist profile and the focus margin are improved on i‐line reduction projection printing by using this system.