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Application of silicon polymer as positive photosensitive material
Author(s) -
Aoai Toshiaki,
Umehara Akira,
Kamiya Akihiko,
Matsuda Nobuaki,
Aotani Yoshimasa
Publication year - 1989
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760291312
Subject(s) - photosensitivity , steric effects , polymer , hydrolysis , silicon , materials science , oxadiazole , catalysis , solubility , side chain , triazine , chemical structure , polymer chemistry , photochemistry , organic chemistry , chemistry , composite material , optoelectronics
A new positive‐working photosensitive system of silicon polymer, containing silylether groups in the main chain and a photo‐induced acid precursor was investigated. The silicon polymer is hydrolized by a photogenerated acid and degraded to low molecular weight compounds. Thus the effect of solubility inhibition of the polymer is diminished. The higher photosensitivity of this system as compared with 1,2‐quinone diazide compounds is due to the catalytic reaction of the acid on the hydrolysis of the silicon polymer. The chemical structure around silylether groups in the polymer, in particular more hydrophilic and less steric structures, affects the rate of hydrolysis and thus the photosensitivity. Among various types of photo‐induced acid precursors examined, e.g., s‐triazine and 1,3,4‐oxadiazole compounds substituted by trihalomethyl groups were effective.