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Novolac‐Based photoresists combining chemical amplification and dissolution inhibition
Author(s) -
O'brien Michael J.
Publication year - 1989
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760291303
Subject(s) - dissolution , resist , materials science , onium , salt (chemistry) , permeation , gel permeation chromatography , chemical engineering , polymer , nanotechnology , organic chemistry , chemistry , composite material , layer (electronics) , engineering , ion , biochemistry , membrane
This paper concerns a more in‐depth examination of the different components which make up positive photoresists based on the combined principles of chemical amplification and dissolution inhibition. Included is a discussion of the requirements for materials to be used as dissolution inhibitors in this scheme as well as an example of an optimum compound‐t‐butyl‐cholate. Also considered are the effects of onium salt counteranions on resist performance including gel permeation chromatographic (GPC) analyses of the changes in novolac molecular weight distribution which can occur during irradiation and postbake.