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Calorimetric characterization of photosensitive materials
Author(s) -
Appelt B. K.,
Abadie M. J. M.
Publication year - 1988
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760280604
Subject(s) - photoresist , resist , materials science , reactivity (psychology) , vitrification , characterization (materials science) , monomer , thermal , calorimetry , polymerization , chemical engineering , polymer chemistry , polymer , thermodynamics , nanotechnology , composite material , medicine , alternative medicine , physics , pathology , layer (electronics) , engineering , andrology
A negative‐acting dry‐film photoresist was examined via both photocalorimetry and conventional calorimetry. The photo reaction of the resist was investigated as a function of temperature, and two distinct regimes with different activation energies have been identified. Possible reaction mechanisms were discussed in terms of termination reactions of the polymerization as well as effects of vitrification. The thermal reactivity of this particular resist was studied as well. It was possible to use Kissinger's equations to predict thermal aging effects. Finally, the utility of photocalorimetry as a tool to examine quickly the reactivity of monomers and initiator systems was demonstrated.