A molded deep‐UV portable conformable masking system | Zendy

Lin B. J. | Zendy; Chao V. W. | Zendy; Petrillo K. E. | Zendy; Yang B. J. L. | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Premium

A molded deep‐UV portable conformable masking system

Author(s) -

Lin B. J.,

Chao V. W.,

Petrillo K. E.,

Yang B. J. L.

Publication year - 1986

Publication title -

polymer engineering and science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.503

H-Index - 111

eISSN - 1548-2634

pISSN - 0032-3888

DOI - 10.1002/pen.760261607

Subject(s) - conformable matrix , materials science , masking (illustration) , thermal stability , mold , layer (electronics) , copolymer , composite material , polymer , chemical engineering , engineering , art , visual arts

A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here

Accelerating Research