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A molded deep‐UV portable conformable masking system
Author(s) -
Lin B. J.,
Chao V. W.,
Petrillo K. E.,
Yang B. J. L.
Publication year - 1986
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760261607
Subject(s) - conformable matrix , materials science , masking (illustration) , thermal stability , mold , layer (electronics) , copolymer , composite material , polymer , chemical engineering , engineering , art , visual arts
A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines.