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A new negative working resist for UV light lithography
Author(s) -
Nakane Hisashi,
Yokota Akira,
Yamamoto Shirushi,
Kanai Wataru
Publication year - 1983
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760231815
Subject(s) - resist , materials science , lithography , extreme ultraviolet lithography , nanotechnology , x ray lithography , optics , optoelectronics , physics , layer (electronics)
A new negative working photo resist for UV lithography has been produced based on poly(methylisopropenylketone). Its significant characteristic is a minimal swelling upon development, with resulting high resolution capability.