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Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
Author(s) -
Willson C. Grant,
Ito Hiroshi,
Miller Dolores C.,
Tessier T. G.
Publication year - 1983
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760231805
Subject(s) - resist , materials science , cathode ray , composite material , beam (structure) , electron , optics , physics , nuclear physics , layer (electronics)
A mechanistic hypothesis is presented which explains the radiation chemistry of poly(methyl α‐haloacrylate)s. In order to test the hypothesis poly(methyl α‐trifluoromethylacrylate) PMTFMA was synthesized together with copolymers of methyl methacrylate (MMA), and the α‐trifluoromethyl analog. The mechanistic hypothesis predicts that PMTFMA should have a higher G scission than PMMA and that it should have no crosslinking propensity. This prediction was verified by experiment. Imaging of PMTFMA as a positive e ‐beam resist is also presented. The new material is a more sensitive resist than PMMA.