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Effect of varying the composition of copolymers of glycidyl methacrylate and 3‐chlorostyrene (GMC) on electron lithographic performance
Author(s) -
Novembre A. E.,
Bowden M. J.
Publication year - 1983
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760231711
Subject(s) - glycidyl methacrylate , copolymer , dispersity , materials science , polymer chemistry , polymerization , cls upper limits , analytical chemistry (journal) , polymer , chemistry , composite material , organic chemistry , medicine , optometry
The polymerization kinetics, molecular parameters, and electron lithographic response of a series of copolymers of glycidyl methacrylate (GMA) and 3‐chlorostyrene (CLS) have been determined. The polymerization rate, molecular weight, and polydispersity decrease with increasing mole fraction of 3‐chlorostyrene ( X CLS ). Similarly, the sensitivity of this system decreases as the percentage of CLS in the copolymer increases. The value of D g 0.5for the copolymer containing 14.3 mole percent CLS is 0.45 μ C /cm 2 increasing to 3.2 μ C /cm 2 for the 54 percent CLS copolymer of equivalent molecular weight. On the contrary the wet air and O 2 plasma etch rates decrease as X CLS increases. For example, the etch rate using wet air for PGMA is ∼ 30 percent greater than GMC ( X CLS = 0.54). The post exposure polymerization rate decreases as the CLS content increases. The extent of the post cure reaction is dose dependent being a maximum at D g 0.6= 0.64 μ C /cm 2 for the copolymer containing 14.3 mole percent CLS.