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Effect of chemical composition upon the radiation and electron beam resist behaviors of vinyl polymers
Author(s) -
Helbert J. N.,
Iafrate G. J.,
Pittman C. U.,
Lai J. H.
Publication year - 1980
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760201608
Subject(s) - resist , materials science , polymer , substituent , scattering , absorption (acoustics) , electron beam processing , copolymer , irradiation , chemical composition , chlorine , chemical bond , cathode ray , electron , polymer chemistry , chemistry , organic chemistry , nanotechnology , composite material , optics , physics , layer (electronics) , nuclear physics , metallurgy , quantum mechanics
Chemical composition effects upon polymer electron energy absorption and radiation chemistry have been identified to develop resist design criteria. By use of Bethe's theory for electron scattering in solids, chemical incorporation of higher atomic‐numbered substituents is predicted to decrease energy absorption and increase scattering. Incorporation of chlorine or fluorine into vinyl polymers at the possible substituent sites is empirically found to have a large effect upon radiation G (scission) and G (crosslink) values. G (scission) values determined for several copolymers over a large range of compositions are found to vary linearly with composition. In contrast, G (crosslink) values are found to be generally less than those predicted from a linear extrapolation between the homopolymer values. Electron beam resist behavior is found to correlate well with the G s / G x ratio.