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Radiation degradation behavior of chlorine‐containing vinyl copolymers. Search for improved electron‐beam resists
Author(s) -
Helbert John N.,
Poindexter Edward H.,
Pittman Charles U.,
Chen ChiYu
Publication year - 1980
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760200908
Subject(s) - copolymer , methyl methacrylate , materials science , resist , polymer chemistry , vinyl chloride , irradiation , degradation (telecommunications) , polymer , poly(methyl methacrylate) , chloride , composite material , telecommunications , physics , layer (electronics) , computer science , nuclear physics , metallurgy
Vinyl copolymers with high radiation degradation sensitivity have been synthesized by copolymerizing vinylidene chloride (VDC), CH 2 = CCl 2 , with methyl methacrylate (MMA), methacrylonitrile, methyl α‐chloroacrylate, and dimethyl itaconate using emulsion techniques. In addition, copolymers of methyl α‐chloroacrylate with methyl methacrylate and poly(α‐chloroaerylonitrile) were studied. Introduction of vinylidene chloride into methyl methacrylate polymers caused a sharp increase in G s even at relatively low VDC incorporation. Upon 29 percent VDC incorporation, the G s value increased from 1.3 (homopolymer of MMA) to 3.4. G s was found to be a linear function of copolymer content for several systems, but G x was not. At higher VDC levels, the increase in G s was countered by increases in G x . At lower VDC levels, G x was suppressed below the values predicted by a linear G x dependence on composition for such systems as VDC/MMA, MCA/MMA, and α‐chloroacrylonitrile/MMA. The VDC/MMA co‐polymer(29 percent VDC) gavea sensitivity of 4.0 × 10 −5 C/cm 2 to electron beam exposure using the 0 percent unexposed resist thickness loss criterion and is 2–3 times more sensitive than PMMA. Poly(α‐chloroacrylonitrile) is a negative resist with a sensitivity of 5 × 10 −5 C/cm 2 using one‐micron line images for testing.