Thermally‐reacted poly(methacrylamide) as a positive electron beam resist | Zendy

Matsuda S. | Zendy; Tsuchiya S. | Zendy; Honma M. | Zendy; Hasegawa K. | Zendy; Nagamatsu G. | Zendy; Asano T. | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Premium

Thermally‐reacted poly(methacrylamide) as a positive electron beam resist

Author(s) -

Matsuda S.,

Tsuchiya S.,

Honma M.,

Hasegawa K.,

Nagamatsu G.,

Asano T.

Publication year - 1977

Publication title -

polymer engineering and science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.503

H-Index - 111

eISSN - 1548-2634

pISSN - 0032-3888

DOI - 10.1002/pen.760170616

Subject(s) - resist , methacrylamide , materials science , irradiation , cathode ray , electron beam processing , electron , ion , glass transition , copolymer , composite material , polymer , chemistry , organic chemistry , acrylamide , physics , layer (electronics) , quantum mechanics , nuclear physics

Thermally‐reacted poly(methacrylamide) degrades under high‐energy irradiation. It has a sensitivity of 2‐3 × 10 −7 C/cm 2 when exposed to 10 KV electrons. The resist is thermally stable to 330°C and has a high glass transition temperature, 180 200°C. It may be used for the lift‐off process and ion‐milling.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here

Accelerating Research