Premium
The synthesis, characterization, evaluation, and processing of selected cyclo‐olefin sulfone copolymers as electron beam resists
Author(s) -
Himics R. J.,
Kaplan M.,
Desai N. V.,
Poliniak E. S.
Publication year - 1977
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760170615
Subject(s) - materials science , copolymer , resist , olefin fiber , sulfone , polymer , cathode ray , characterization (materials science) , solubility , electron beam processing , beam (structure) , electron , hildebrand solubility parameter , polymer chemistry , chemical engineering , composite material , nanotechnology , organic chemistry , optics , chemistry , physics , engineering , layer (electronics) , quantum mechanics
Abstract The potential usefulness of electron beam sensitive polymers depends to a large extent on a variety of polymer characteristics such as solubility, sensitivity, and processability which are, in turn, required by the application. This paper details results obtained for methylcyclopentene sulfone copolymers as electron beam recording media. The determination of physical properties and the optimization of processing conditions are reported.