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Studies of methyl methacrylate‐methyl α‐chloroacrylate, copolymers and poly(methyl α‐chloroactylate) as electron sensitive positive resists
Author(s) -
Lai Juey H.,
Shepherd Lloyd T.,
Ulmer Robert,
Griep Carl
Publication year - 1977
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760170614
Subject(s) - methyl methacrylate , copolymer , materials science , poly(methyl methacrylate) , polymer chemistry , resist , dimethylformamide , methacrylate , polymer , chemistry , organic chemistry , nanotechnology , composite material , layer (electronics) , solvent
Poly(methyl α‐chloroacrylate) (PMCA) and the copolymers of methyl methacrylate and methyl α‐chloroacrylate (poly(MMA‐co‐MCA)) have been reported recently to be more susceptible to radiation degradation than poly(methyl methacrylate) (PMMA). In this paper we report our studies of PMCA and poly(MMA‐co‐MCA) as electron‐sensitive positive resists. It has been found that both PMCA and the copolymers are more sensitive than PMMA. Using mixtures of dimethylformamide and 2‐propanol as developers, the sensitivities of PMCA and poly(MMA‐co‐MCA) (38 mole percent MCA) have been found to be 1 × 10 −5 and 6 × 10 −6 coulomb/cm 2 , respectively. It has also been found that crosslinking predominates in PMCA when the electron dose exceeds 6 × 10 −4 coulomb/cm 2 .