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Three dimensional behavior of negative electron resists
Author(s) -
Heidenreich R. D.,
Kammlott G. W.
Publication year - 1977
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760170609
Subject(s) - resist , materials science , line width , swelling , transverse plane , deformation (meteorology) , resolution (logic) , substrate (aquarium) , electron , optics , line (geometry) , composite material , molecular physics , geometry , physics , structural engineering , nuclear physics , oceanography , layer (electronics) , artificial intelligence , geology , computer science , engineering , mathematics
It is illustrated experimentally that swelling and deformation of narrow lines (width < 1 μm) is an important limitation on the fidelity and transverse resolution of negative electron resists. The thickness response curve developed for negative resists is discussed and the effect of feature size is introduced through the experimental parameter D g R , the rigid gel dose, or the dose required to initiate a free standing line of width < 0.2 μm. The transition from line to area exposure is discussed and the effect of substrate backscatter or transverse resolution in gratings is calculated. The observed resolution is 3‐5 times the calculated value from swelling and deformation during development.