Premium
New photoresists of cyclized butadlene polymers
Author(s) -
Harita Y.,
Ichikawa M.,
Harada K.,
Tsunoda T.
Publication year - 1977
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760170608
Subject(s) - resist , photoresist , polybutadiene , materials science , thermogravimetric analysis , polymer , polymer chemistry , composite material , chemical engineering , copolymer , layer (electronics) , engineering
A new photoresist composed of cyclized cis‐1, 4‐polybutadiene has been developed. The resist has much higher sensitivity on exposure to ultraviolet light than the conventional resist from cyclized polyisoprene. This new resist has no resist‐flow even at 250°C, and provides high resolution on baking at 200°C. Thermogravimetric analysis showed that the cyclized polybutadiene decomposes at temperature higher than cyclized polyisoprene.