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The interaction of 5 KeV electrons with polymers of methyl isopropenyl ketone
Author(s) -
Levine Aaron W.,
Kaplan Michael,
Poliniak Eugene S.
Publication year - 1974
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760140711
Subject(s) - depolymerization , materials science , polymer , copolymer , monomer , scanning electron microscope , solvent , resist , dispersity , polymer chemistry , fabrication , ketone , chemical engineering , nanotechnology , composite material , organic chemistry , chemistry , medicine , alternative medicine , layer (electronics) , pathology , engineering
Poly(methyl isopropenyl ketone) (PMIPK) degrades upon exposure to 5 keV electrons. Using a scanning electron microscope to expose fine‐line raster patterns in thin films of this polymer and subsequently solvent‐developing the thus‐degraded regions, sharp walled troughs are observed, the width of which is a measure of the sensitivity to degradation. Copolymers with several vinyl monomers were prepared and the sensitivities of these were similarly determined. Information relevant to the mechanism of depolymerization was obtained by comparing homopolymers with copolymers and by the use of additives in the irradiated polymer films. Examples of potential device‐fabrication techniques using PMIPK resist are given.