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Electron beam processing systems (a state of the art review)
Author(s) -
Hatzakis M.
Publication year - 1974
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760140710
Subject(s) - resist , microfabrication , cathode ray , materials science , electron , beam (structure) , electron beam processing , electron beam lithography , nanotechnology , optics , physics , nuclear physics , fabrication , medicine , alternative medicine , layer (electronics) , pathology
This paper presents a review of electron‐sensitive resists evaluated for electron beam exposure. This includes positive as well as negative resists and their relative merits and drawbacks. The paper also presents general guidelines that can be used in evaluating any electron resist system for performance and usefulness in electron beam microfabrication.