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Azide photoresists for projection photolithography
Author(s) -
Clecak N. J.,
Cox R. J.,
Moreau W. M.
Publication year - 1974
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760140705
Subject(s) - materials science , photoresist , polymer , photolithography , cyclohexanone , degree of unsaturation , azide , projection (relational algebra) , polymer chemistry , composite material , nanotechnology , organic chemistry , chemistry , mathematics , layer (electronics) , algorithm , catalysis
The spectral sensitivity of bisazide sensitized rubbers has been extended to 5000Å by the addition of p‐azidocinnamylidene derivatives of cyclohexanone. The photoresists were suitable for projection exposure at 4050 and 4350 Hg lines. The photospeed of the compositions is enhanced by increasing the unsaturation of the polymer component. Speed increase could also be obtained by exposure of the films at elevated temperatures.