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Ultraviolet depolymerization of photoresist polymers
Author(s) -
Bolon D. A.,
Kunz C. O.
Publication year - 1972
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760120206
Subject(s) - photoresist , polymer , materials science , depolymerization , ultraviolet , ultraviolet light , photolithography , chemical engineering , polymer science , nanotechnology , polymer chemistry , composite material , optoelectronics , layer (electronics) , engineering
A new method for removal of thin films of photoresist polymers has been found. When polymeric films are exposed to ultraviolet light in the presence of air, the material can be removed leaving an extremely clean surface, free of carbonaceous material. This process has been examined for a variety of photoresist polymers as well as on nonphotoresist polymers and on a variety of substrates. The process offers a new method of photoresist removal.