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Holographic grating formation in photopolymers—Polymethylmethacrylate
Author(s) -
Laming F. P.
Publication year - 1971
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.760110512
Subject(s) - holography , diffraction efficiency , materials science , photopolymer , optics , grating , interference (communication) , diffraction , polymer , holographic grating , ultraviolet , diffraction grating , optoelectronics , composite material , polymerization , computer science , physics , computer network , channel (broadcasting)
Polymethylmethacrylate has been sensitized to 4880 A light and used as a holographic recording medium. The polymer is sensitized with a material which may itsel be degraded by exposure to ultraviolet light. The new process is, therefore, both self‐developing and fixable without chemical processing. Holographic diffraction gratings written into this material have diffracting efficiencies as high as 70 percent. Various parameters such as angular selectivity, film thickness, variation of diffracting efficiency with writing angle etc., have been studied. The spontaneously produced diffracted intensity is so high that efficient interference between first and zero ordes is observed during the writing process.