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Facile Visible‐Light‐Induced Preparation and Hydrophobization of Porous polyEGDMA and polyTEGDMA Thick Monoliths
Author(s) -
Lenshiina A.,
Arsenyev Maxim V.,
Baten'kin Maxim A.,
Polushtaytsev Yuri V.,
Chesnokov Sergey A.
Publication year - 2020
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.25326
Subject(s) - materials science , photomask , polymer , surface modification , photoinitiator , porosity , wetting , contact angle , photopolymer , triethylene glycol , composite material , chemical engineering , polymer chemistry , resist , polymerization , monomer , engineering , layer (electronics)
The simple low‐cost method for synthesis and post‐functionalization of thick macroporous polymer monoliths was proposed and realized by example of obtaining and hydrophobization of monoliths based on mono‐ and triethylene glycol dimethacrylates. Described procedures comprise using of ubiquitous visible‐light projection system and single photoinitiator (9,10‐phenanthrenequinone) in both cases. This approach eliminates the need in “material” photomasks and permit to operate with computer generated virtual photomask to form the pattern of functionalization. Macroporous polymer monoliths of 2 and 4 mm in thickness with a system of interconnected pores were synthesized and hydrophobized. The thick layers of functionalized porous polymer with wetting pattern through the entire sample thickness with the water contact angle for hydrophobic parts reaching120–125° were obtained. POLYM. ENG. SCI., 60:682–689, 2020. © 2020 Society of Plastics Engineers