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Atomic layer deposition TiO 2 /Al 2 O 3 nanolayer of dyed polyamide/aramid blend fabric for high intensity UV light protection
Author(s) -
Xiao Xingfang,
Liu Xin,
Cao Genyang,
Zhang Chunhua,
Xia Liangjun,
Xu Weilin,
Xiao Shili
Publication year - 2015
Publication title -
polymer engineering and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.503
H-Index - 111
eISSN - 1548-2634
pISSN - 0032-3888
DOI - 10.1002/pen.24068
Subject(s) - materials science , polyamide , aramid , x ray photoelectron spectroscopy , scanning electron microscope , composite material , atomic layer deposition , layer (electronics) , polymer , deposition (geology) , ultraviolet , light intensity , chemical engineering , fiber , optoelectronics , optics , paleontology , physics , sediment , engineering , biology
Ultraviolet (UV) irradiation can cause a severe damage to textiles, such as color fading, polymer degradation, and mechanical strength decrease. The aim of this study was to deposit inorganic UV blocking agents onto polyamide/aramid dyed fabric using atomic layer deposition (ALD) technique to produce functional fabrics that are resistant to high intensity UV light. Scanning electron microscopy (coupled to energy‐dispersive spectroscopy), X‐ray photoelectron spectroscopy, and thermogravimetry studies demonstrated that TiO 2 , Al 2 O 3 , and TiO 2 /Al 2 O 3 nanolayer could be successfully deposited onto the fiber surface. The dyed fabrics with different ALD coatings showed excellent high intensity UV resistance and were also more resistant to high intensity UV‐induced mechanical strength damage. These results suggested that the ALD technology could be effective technique to improve the properties of dyed fabrics. POLYM. ENG. SCI., 55:1296–1302, 2015. © 2015 Society of Plastics Engineers