z-logo
Premium
Influence of different percentages of N ‐phenylaminopropyl—poss on the degradation kinetic of epoxy resin
Author(s) -
Pistor Vinícius,
Soares Bluma Guenther,
Mauler Raquel Santos
Publication year - 2012
Publication title -
polymer composites
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.577
H-Index - 82
eISSN - 1548-0569
pISSN - 0272-8397
DOI - 10.1002/pc.22271
Subject(s) - thermogravimetric analysis , silsesquioxane , materials science , nanocomposite , epoxy , thermal stability , activation energy , diffusion , degradation (telecommunications) , transmission electron microscopy , composite material , kinetic energy , scanning electron microscope , kinetics , chemical engineering , polymer , chemistry , thermodynamics , nanotechnology , physics , telecommunications , quantum mechanics , computer science , engineering
In the present study, nanocomposites were prepared with different contents (1, 2, 5, 10% by weight) of polyhedral oligomeric silsesquioxane—POSS n ‐phenylaminopropyl in an epoxy matrix. The samples were characterized by thermogravimetric analysis (TGA), transmission electron microscopy (TEM), and X‐ray diffraction (XRD). TGA analyses were performed at different heating rates to allow for the prediction of the kinetic parameters of degradation. XRD analyses were used to calculate the average molecular interchain spacing. TGA analysis showed that the presence of POSS increased the thermal stability of the nanocomposites. An increase in the activation energy on degradation was evidenced through the kinetic parameters, especially for the 10% POSS. Moreover, the addition of POSS changed the kinetic mechanism of the deceleratory mode ( F n ) in favor of the diffusion ( D n ) process. The diffusion mechanism is corroborated by the XRD analyses that showed the increase of distance between chains when was added POSS. POLYM. COMPOS., 2012. © 2012 Society of Plastics Engineers

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here