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Thinner‐film plastic photovoltaic cells based on different C 60 derivatives
Author(s) -
Yang Chunhe,
Li Yongjun,
Hou Jianhui,
He Chang,
Tan Zhan'ao,
Fan Benhu,
Zhou Yi,
Sun Qingjian,
Li Yuliang,
Li Yongfang,
Zhu Daoben
Publication year - 2006
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.740
Subject(s) - materials science , polymer , acceptor , photovoltaic system , energy conversion efficiency , active layer , photoresistor , equivalent series resistance , electron acceptor , optoelectronics , chemical engineering , photochemistry , layer (electronics) , nanotechnology , composite material , chemistry , electrical engineering , physics , engineering , voltage , condensed matter physics , thin film transistor
In order to fabricate tandem‐structured polymer photovoltaic cells, thinner‐film photocells with different soluble C 60 derivatives as the acceptors are fabricated and characterized in detail. It is shown that the aggregation, derived from the compatibility and the dispersion, of the acceptors in the polymer matrix (the donor) determines the film forming properties, the optimized content of the acceptors, the best thickness of the blend film for devices, and the apparent power conversion efficiency of the corresponding photocells. In the photocells with MEH‐PPV [poly(2‐methoxyl‐5‐2′‐ethylhexyoxyl‐1,4‐phenylene vinylene)] as the donor, the device with a film thickness of only 60 nm, HN‐C 60 as the acceptor exhibits the better power conversion efficiency of 1.6% than that of PCBM as the electron acceptor which is employed widely in the investigation of high‐efficiency polymer photovoltaic cells. The series resistance and the shunt resistance of the different photocells are also extracted and analyzed as a result of the aggregation of polymer and C 60 molecules in the active layer to explain the performance of the photocells based on the distribution of acceptors in the active blend films. Copyright © 2006 John Wiley & Sons, Ltd.