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Recent progress in high resolution lithography
Author(s) -
Bratton Daniel,
Yang Da,
Dai Junyan,
Ober Christopher K.
Publication year - 2006
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.662
Subject(s) - lithography , photolithography , computational lithography , nanotechnology , microelectronics , materials science , next generation lithography , nanolithography , multiple patterning , resist , electron beam lithography , optoelectronics , fabrication , medicine , alternative medicine , layer (electronics) , pathology
Abstract The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to “unconventional” soft lithography and the self‐assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two‐photon lithography, step‐and‐flash imprint lithography and nanofabrication using block copolymers are covered, in an attempt to describe more recent work in this vibrant and active field of research. Copyright © 2006 John Wiley & Sons, Ltd.