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Residue analysis of thermally depolymerized phthalaldehyde‐based polymer thin films
Author(s) -
Engler Anthony,
Lo Chi Kin,
Kohl Paul A.
Publication year - 2021
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.5244
Subject(s) - x ray photoelectron spectroscopy , depolymerization , residue (chemistry) , materials science , thermal decomposition , polymer , chemical engineering , resist , mass spectrometry , thin film , copolymer , thermogravimetric analysis , char , secondary ion mass spectrometry , polymer chemistry , analytical chemistry (journal) , pyrolysis , organic chemistry , chemistry , nanotechnology , composite material , chromatography , layer (electronics) , engineering
In this study, thermolysis of poly(phthalaldehyde), pPHA, was investigated, and the nonvolatile residues produced were characterized by bulk and surface analyses to provide insight into its use as a resist material for thermal scanning probe lithography. A temperature of 300°C for a short time was required to remove nearly all of the residue produced from pPHA depolymerization. X‐ray photoelectron spectroscopy (XPS) was used to quantify the trace amount of hydrocarbon residue after thermolysis. Time‐of‐flight secondary ion mass spectrometry (SIMS) results show that the residue is largely PHA monomers and oligomers, but also include hydrocarbon char. Differences in molecular weight and composition of the residue as a function of copolymer composition were investigated to give insight into designing new thermal resist materials.