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Synthesis of polysiloxanes containing trifluoroethylene aryl ether groups: The effect of promoters
Author(s) -
Yuan Yan,
Diao Shen,
Zhao Caide,
Wang Mingying,
Wang Xue,
Wang Quanjie
Publication year - 2020
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.4847
Subject(s) - polymerization , polymer chemistry , materials science , polymer , monomer , differential scanning calorimetry , thermogravimetric analysis , dimethylformamide , chemistry , organic chemistry , composite material , physics , solvent , thermodynamics
Polysiloxanes with high molecular weight ( M n  > 100 000, M w / M n  < 2.2) containing various quantity of trifluoroethylene aryl ether groups were prepared by anion ring opening polymerization (AROP) in the presence of promoters including N , N ‐dimethylformamide (DMF) and N‐methyl pyrrolidone (NMP). The structures of monomers and polymers were characterized by FTIR and NMR. It was found that the addition of promoter could significantly increase the polymerization rate, decrease the polymerization temperature, and increase the molecular weight of the polymer. When DMF as the promoter, the optimal conditions for polymerization were as follows: The polymerization temperature is 100°C, the amount of catalyst is 2.0%, and the molar ratio of promoter to catalyst is 160:1. The optimal conditions for polymerization using NMP as the promoter were as follows: The polymerization temperature is 75°C, the amount of catalyst is 2.0%, and the molar ratio of promoter to catalyst is 70:1, which indicated that NMP is more effective on AROP than DMF. Thermogravimetric analysis (TGA) showed that the polymer has good heat temperature resistance. Differential scanning calorimetry (DSC) showed that the introduction of NMP in bulk polymerization could improve the randomness of polymer structure, which leads to the disappearance of crystal peak and improve the low temperature resistance of polymer.

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