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Directed self‐assembly of block copolymer‐based nanocomposites in thin films
Author(s) -
Michman E.,
Shenhar R.
Publication year - 2017
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.3850
Subject(s) - materials science , nanotechnology , copolymer , nanolithography , lithography , nanoparticle , nanocomposite , self assembly , block (permutation group theory) , polymer , optoelectronics , fabrication , composite material , medicine , alternative medicine , pathology , geometry , mathematics
Exploiting the full potential of metal and semiconductor nanoparticles for advanced nanotechnological applications requires their organization into predefined structures with high orientational control. Nanofabrication approaches that combine high resolution lithography and self‐assembly afford the advantages of accurate placement, compositional diversity, and reduced production costs. This review concentrates on the creation of organized nanoparticle superstructures assisted by recent developments in the directed self‐assembly of block copolymers, and delineates possible applications. Copyright © 2016 John Wiley & Sons, Ltd.