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Synthesis and properties of UV curable polyvinylsilazane as a precursor for micro‐structuring
Author(s) -
Li YiHe,
Ahn KwangDuk,
Kim DongPyo
Publication year - 2015
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.3448
Subject(s) - materials science , stereolithography , photoresist , acrylate , ceramic , isocyanate , uv curing , fabrication , chemical engineering , polymer , proton nmr , polymer chemistry , polyurethane , nanotechnology , composite material , curing (chemistry) , organic chemistry , copolymer , layer (electronics) , medicine , chemistry , alternative medicine , pathology , engineering
Photosensitive acrylated polyvinylsilazanes were prepared by reacting a diacrylate containing compound, 1,1‐bis (acryloyloxyethyl) ethyl isocyanate (BAEI), with polyvinylsilazane (PVSZ) and utilized as an inorganic photoresist for generating SiCN‐based ceramic microstructures. The acrylate‐modified polymers (m‐PVSZ) were characterized by 1 H‐NMR, 13 C‐NMR and FT‐IR methods to determine the chemical reaction mechanism. Differential photo‐calorimeter and FT‐IR analysis were employed to examine its photosensitive properties. Line patterns were fabricated by a UV nano‐imprinting method; multi‐layered octagon structures were fabricated by a two‐photon absorption stereolithography process. The results indicate that m‐PVSZ is quite a novel inorganic photoresist for the fabrication of micro ceramic structures. Copyright © 2015 John Wiley & Sons, Ltd.
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