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Silica‐based hybrid nonlinear optical chromophore‐trapping film prepared by sol‐gel polymerization
Author(s) -
Ji Shengxiang,
Li Ze,
Zhou Xiaoshu,
Cao Ming,
Dai Daorong,
Zhang Rongben,
Li Shaojun,
Ye Cheng
Publication year - 2003
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.302
Subject(s) - materials science , hydrosilylation , thermal stability , poling , chromophore , sol gel , monomer , second harmonic generation , polymer chemistry , differential scanning calorimetry , organosilicon , fourier transform infrared spectroscopy , polymerization , polymer , phenylene , chemical engineering , optics , photochemistry , composite material , organic chemistry , catalysis , nanotechnology , optoelectronics , laser , chemistry , physics , thermodynamics , dielectric , engineering , ferroelectricity
A new thermal‐resistant second‐order nonlinear optical film has been prepared by in situ poling and sol–gel processing of 1,4‐phenylene bis(4‐trimethoxylsilylethylbenzoate) (PMSE) and Disperse Red 1 (DR1). The monomer, PMSE, was synthesized by Pt‐catalyzed hydrosilylation reaction followed by alcoholysis reaction. The chromophore DR1 was embedded in the crosslinked organosilicon polymeric matrix. The film was characterized by FTIR, differential scanning calorimeter (DSC), and X‐ray diffraction (XRD). The elemental analysis shows the DR1 content of the poled film to be about 11 wt%. The second‐order harmonic generation (SHG) coefficient (d 33 ) of the film is 16.7 pm/v and its thermal stability studies demonstrate that the onset of d 33 decay is about 130 °C. Copyright © 2003 John Wiley & Sons, Ltd.