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Three‐component photopolymers based on thermal crosslinking and acidolytic de‐crosslinking of vinyl ether groups. 2. effects of acid components on photopolymer characteristics
Author(s) -
Moon Seongyun,
Yamaoka Tsuguo
Publication year - 1995
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.1995.220060803
Subject(s) - materials science , photopolymer , copolymer , polymer chemistry , acrylic acid , reactivity (psychology) , alkoxy group , styrene , polymer , polymerization , organic chemistry , composite material , chemistry , alkyl , pathology , medicine , alternative medicine
The three‐component photopolymers consisting of poly(p‐hydroxystyrene) (PHS) or poly(styrene‐co‐acrylic acid) (PSA) as the binder polymer, 2,2‐bis(4‐(2‐(vinyloxy)ethoxy)phenyl)propane (BPA‐DEVE) or 1,1,1‐tris(4‐(2‐(vinyloxy)ethoxy)phenyl)ethane (THPETEVE) as the crosslinking agent, and a photoacid generator were investigated with regard to their lithographic characteristics and thermal crosslinking reactivity because of the acidity of the acid component. The thermal crosslinking rate can be represented as the pseudo first‐order reaction. The PSA copolymer with an acrylic acid unit has the higher crosslinking rate and sensitivity, and the lower activation energy. Under low baking temperatures at which crosslinking does not take place, dual‐mode resist behavior is observed.