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A novel UV‐sensitive photopolymerization system with microgel matrix
Author(s) -
Sasa Nobumasa,
Yamaoka Tsuguo
Publication year - 1994
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.1994.220050203
Subject(s) - photopolymer , materials science , copolymer , divinylbenzene , monomer , styrene , polymer chemistry , acrylate , polymer , ultraviolet light , photosensitivity , chemical engineering , composite material , optoelectronics , engineering
A series of crosslinked microgels with quaternary ammonium ions on the surface was prepared by quaternization with N,N‐dimethylbenzylamine in the presence of microgel particles prepared by emulsion copolymerization of styrene (St), chloromethylstyrene (CMS) and divinylbenzene (DVB). Microgels with diameters in the range of 15–100 nm were successfully dispersed in organic solvents such as 2‐methoxyethanol and 2‐ethoxyethanol without an emulsifier. A photosensitive layer was formed by coating a photosensitive solution on a grained aluminum plate. The solution was comprised of the microgels, the multifunctional monomer and standard ultraviolet (UV) photoinitiators, such as 2,4‐diethyl thioxanthone (DETX)/ethyl p‐di‐ethylaminobenzoate (EPA). This gave a heterogeneous photosensitive layer which produced good polymer patterns after exposure to UV light followed by development in tap water. A typical polymer layer, consisting of the microgels (poly(styrene‐co‐N,N‐dimethylbenzylvinyl‐benzylammonium chloride‐co‐divinylbenzene)), DETX/EPA, and the multifunctional acrylate monomers, exhibited photosensitivity of 0.06 mJ/cm 2 for UV light. This sensitivity is much higher than the homogeneous photopolymerization system with an analogous composition.