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Photosensitive polyimides consisting of simple mixtures of 4‐substituted diazonaphthoquinones and polyamic acids
Author(s) -
Hayase Shuzi,
Mikogami Yukihiro,
Takano Kei,
Nakano Yoshihiko,
Hayase Rumiko
Publication year - 1993
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.1993.220040411
Subject(s) - resist , polyimide , thermal stability , materials science , polymer chemistry , sulfonate , copolymer , polymer , organic chemistry , chemistry , nanotechnology , composite material , sodium , layer (electronics) , metallurgy
Polyimide resists that can be developed with a basic aqueous solution were produced by simple mixtures of conventional polyamic acids and naphthoquinone diazides in which sulfonate groups are substituted at the 4‐position. The diazonaphthoquinones bearing electron‐withdrawing groups gave negative tone resists. On the other hand, those bearing electron‐donating groups gave positive tone resists. The difference in the resist behaviors depending on the photoactive structure was explained by crosslinking caused by photogenerated sulfonic acids. The thermal stability of polyimides prepared from the resists was almost the same as that of conventional polyimides.