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Positive photosensitive polyimides with cyclobutane structure
Author(s) -
Abe Toyohiko,
Mishina Makoto,
Kohto Noriaki
Publication year - 1993
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.1993.220040409
Subject(s) - cyclobutane , catalysis , solubility , solvent , materials science , polymer chemistry , organic chemistry , chemistry , ring (chemistry)
Abstract A new family of positive photosensitive polyimide (PPI) systems composed of solvent soluble polyimides (Pls) with cyclobutane (CBDA) structures and diazonaphthoquinone compounds (DNQ) has been prepared. Heat and catalytic imidizations were carried out to obtain CBDA Pls; the former was better than the latter in controlling the molecular weight of the Pl. The OH groups in the Pls were easily acetylated during catalytic imidization, so COOH groups were selected as weak acidic groups in the Pls. The COOH groups were also effective in giving the Pls an alkaline solubility. Therefore, Pls having COOH groups were superior to those having OH groups for PPI systems. The photosensitive properties of various PPl systems containing COOH were found to vary with the fraction of COOH groups in the Pls, the content of DNQ in the systems, and the molecular weight of the Pls.