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Radiation resistance and molecular structure of poly(arylene ether sulfone)s
Author(s) -
Hill David J. T.,
Lewis David A.,
O'Donnell James H.,
Pomery Peter J.,
Hedrick James L.,
McGrath James E.
Publication year - 1991
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.1991.220020102
Subject(s) - arylene , sulfone , bisphenol a , radiation resistance , bisphenol , ether , electron paramagnetic resonance , hydroquinone , materials science , radical , polymer chemistry , irradiation , organic chemistry , nuclear chemistry , chemistry , alkyl , nuclear magnetic resonance , composite material , aryl , epoxy , physics , nuclear physics
The radiation resistance of a series of aromatic polysulfones comprising alternating units of diphenyl sulfone and various aromatic diols has been investigated by measuring volatile products, soluble fractions and electron spin resonance (ESR) spectra. The yields of radicals at 77 K observed by ESR and of SO 2 at 423 K have indicated that biphenol gives enhanced resistance to Y radiation, and tetramethyl bisphenol‐A decreased resistance, relative to bisphenol‐A, bisphenol‐S and hydroquinone. The protective effect of bisphenol was confirmed by lower scission and crosslinking yields determined from the soluble fractions after high doses.