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Visible laser sensitive photopolymers initiated by dye sensitized peroxyester systems
Author(s) -
Yamaoka Tsuguo,
Nakamura Yasuo,
Koseki Kenichi,
Shirosaki Tsutomu
Publication year - 1990
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.1990.220010502
Subject(s) - photopolymer , materials science , photochemistry , argon , laser , benzophenone , visible spectrum , polymer , peroxide , polymerization , polymer chemistry , optics , optoelectronics , organic chemistry , chemistry , composite material , physics
The photoinitiating systems comprising of the peroxide, 3,3′,4,4′‐tetrakis(t‐butylperoxycarbonyl)benzophenone and (keto)coumarin dyes were sensitive to visible light to give photopolymers for argon ion laser exposure. The sensitivity of the photopolymer depends on the matrix polymer, and the highest sensitivity to 488 nm light of the argon ion laser, 0.01 mJ/cm 2 , was obtained with a poly(N‐vinyl‐2‐pyrrolidone) matrix. The sensitization of the peroxide by the dye is due to electron transfer from the excited dye to the peroxide.