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A novel photobleachable polysilane copolymer for optical waveguide fabrication
Author(s) -
He Lei,
Chen Baoxue,
Iso Mamoru
Publication year - 2011
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/pat.1615
Subject(s) - copolymer , materials science , photopolymer , fabrication , monomer , waveguide , thermal stability , polymerization , polymer , polymer chemistry , photosensitivity , chemical engineering , optoelectronics , composite material , medicine , alternative medicine , pathology , engineering
Poly(methylphenylsilane)‐poly(benzylmethacrylate) (PMPS‐PBzMA) block copolymer was prepared by photopolymerization of benzylmethacrylate (BzMA) monomer using PMPS as a macromolecular photo‐radical initiator. Its application as a photobleachable polymer material for optical waveguide fabrication was investigated. By changing weight ratios of BzMA to PMPS during polymerization, the obtained PMPS‐PBzMA showed different photo‐induced refractive changes. PMPS‐PBzMA proved to have good photosensitivity, optical properties, and thermal stability. A multimode PMPS‐PBzMA optical waveguide was achieved, with a propagation loss of 1.0 dB/cm at 1310 nm. Copyright © 2009 John Wiley & Sons, Ltd.