Open AccessThree‐dimensional laser lithography
Author(s) -
Thiel Michael,
Hermatschweiler Martin
Publication year - 2011
Publication title -
optik & photonik
Language(s) - English
Resource type - Journals
eISSN - 2191-1975
pISSN - 1863-1460
DOI - 10.1002/opph.201190386
Subject(s) - lithography , miniaturization , nanotechnology , computational lithography , planar , next generation lithography , dimension (graph theory) , micrometer , maskless lithography , multiple patterning , materials science , photolithography , computer science , engineering , resist , mechanical engineering , electron beam lithography , optoelectronics , computer graphics (images) , mathematics , layer (electronics) , pure mathematics
In the last decades micro‐ and nanotechnology have made enormous progress. One of the key success factors is the continuous improvement of lithographic techniques which are the driving forces of innovation in many industrial areas. So far, lithography on the sub‐micrometer scale has mostly been limited to planar objects. Trends towards further miniaturization and high‐density integration call for disruptive developments of production standards. The next logical step is to go from planar two‐dimensional lithography to the third dimension.