
Surfactant‐Free and Controlled Synthesis of Hexagonal CeVO 4 Nanoplates: Photocatalytic Activity and Superhydrophobic Property
Author(s) -
Yang Xiaojuan,
Zuo Wenli,
Li Feng,
Li Taohai
Publication year - 2015
Publication title -
chemistryopen
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 29
ISSN - 2191-1363
DOI - 10.1002/open.201402163
Subject(s) - photocatalysis , wetting , rhodamine b , materials science , nanomaterials , contact angle , chemical engineering , hydrothermal circulation , nanotechnology , transmission electron microscopy , catalysis , pulmonary surfactant , nanocrystal , hexagonal crystal system , scanning electron microscope , chemistry , organic chemistry , crystallography , composite material , engineering
Nanomaterials with both superhydrophobic surface properties as well as photocatalytic activities could have important industrial applications. Herein, we synthesized CeVO 4 nanocrystals with hexagonal nanoplate structures from the reaction of decavanadate (K 6 V 10 O 28 ⋅9 H 2 O) and CeCl 3 ⋅H 2 O precursors via a hydrothermal method. This synthetic route has four advantages: 1) the reaction condition is relatively mild, 2) it doesn′t need surfactants or templates, 3) it requires no expensive equipment, and 4) products are of higher purity. During synthesis, solution pH, and reaction temperature were found to play important roles in determining the growth process and final morphologies of the CeVO 4 products. These products were characterized spectrophotometrically and via scanning and transmission electron microscopy. Furthermore, the wettability of the as‐synthesized film CeVO 4 nanoplates was studied by measuring water contact angle (CA). The largest CA measured was at 169.5 ° for a glass substrate treated with 0.06 g mL −1 CeVO 4 followed by 2 % 1 H, 1 H, 2 H, 2 H‐perfluorodecyltriethoxysilane. Finally, the CeVO 4 nanoplates exhibited excellent photocatalytic activity in degradation of rhodamine B (RhB) under UV irradiation and was stable even after repeated cycles of use.