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Surface‐induced ion neutralization with high energy deposition
Author(s) -
Chorush Russell A.,
Vidavsky Ilan,
McLafferty Fred W.
Publication year - 1993
Publication title -
organic mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.475
H-Index - 121
eISSN - 1096-9888
pISSN - 0030-493X
DOI - 10.1002/oms.1210281008
Subject(s) - reionization , ion , dissociation (chemistry) , neutralization , analytical chemistry (journal) , atomic physics , ionization , chemistry , deposition (geology) , mass spectrometry , fragmentation (computing) , materials science , physics , chromatography , organic chemistry , sediment , computer science , antibody , immunology , biology , operating system , paleontology
Ion‐to‐neutral conversion at surfaces is found to be complementary to that with gas‐phase targets for neutralization–reionization mass spectrometry and to yield high‐energy neutral species. With an Ag surface deposited on an in‐line Si substrate, neutralization–reionization efficiencies of 0.01% are achieved using 9.8 keV CH 4 +˙ , with the neutral CH 4 receiving a median internal energy of 14 eV; with a conventional target of K vapor, the efficiency is 0.4% with a neutral energy of 8.2 eV expected from their ionization energy difference. The energy deposition can be increased by increasing the potential that deflects ions into the surface; in this way ∼15% of CH 4 neutral species can be given >20 eV of internal energy. Product abundances from CH 4 dissociation provide a useful estimate of the distribution of energy values deposited in neutralization.